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  • High Power Impulse Magnetron Sputtering

    Fundamentals, Technologies, Challenges and Applications

    High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In ... Read more

    $188.99 USD